Plasmonic PHOLED arrangement for displays

ABSTRACT

Device structures are provided that include one or more plasmonic OLEDs and zero or more non-plasmonic OLEDs. Each plasmonic OLED includes an enhancement layer that includes a plasmonic material which exhibits surface plasmon resonance that non-radiatively couples to an organic emissive material and transfers excited state energy from the emissive material to a non-radiative mode of surface plasmon polaritons in the plasmonic OLED.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a non-provisional of, and claims the prioritybenefit of U.S. Provisional Patent Application Ser. Nos. 62/817,436,filed Mar. 12, 2019 and 62/839,855, filed Apr. 29, 2019, the entirecontents of each of which are incorporated herein by reference.

FIELD

The present invention relates to structures and components suitable foruse in organic light emitting diodes (OLEDs) and devices including thesame.

BACKGROUND

Opto-electronic devices that make use of organic materials are becomingincreasingly desirable for a number of reasons. Many of the materialsused to make such devices are relatively inexpensive, so organicopto-electronic devices have the potential for cost advantages overinorganic devices. In addition, the inherent properties of organicmaterials, such as their flexibility, may make them well suited forparticular applications such as fabrication on a flexible substrate.Examples of organic opto-electronic devices include organic lightemitting diodes/devices (OLEDs), organic phototransistors, organicphotovoltaic cells, and organic photodetectors. For OLEDs, the organicmaterials may have performance advantages over conventional materials.For example, the wavelength at which an organic emissive layer emitslight may generally be readily tuned with appropriate dopants.

OLEDs make use of thin organic films that emit light when voltage isapplied across the device. OLEDs are becoming an increasinglyinteresting technology for use in applications such as flat paneldisplays, illumination, and backlighting. Several OLED materials andconfigurations are described in U.S. Pat. Nos. 5,844,363, 6,303,238, and5,707,745, which are incorporated herein by reference in their entirety.

One application for phosphorescent emissive molecules is a full colordisplay. Industry standards for such a display call for pixels adaptedto emit particular colors, referred to as “saturated” colors. Inparticular, these standards call for saturated red, green, and bluepixels. Alternatively the OLED can be designed to emit white light. Inconventional liquid crystal displays emission from a white backlight isfiltered using absorption filters to produce red, green and blueemission. The same technique can also be used with OLEDs. The white OLEDcan be either a single EML device or a stack structure. Color may bemeasured using CIE coordinates, which are well known to the art.

As used herein, the term “organic” includes polymeric materials as wellas small molecule organic materials that may be used to fabricateorganic opto-electronic devices. “Small molecule” refers to any organicmaterial that is not a polymer, and “small molecules” may actually bequite large. Small molecules may include repeat units in somecircumstances. For example, using a long chain alkyl group as asubstituent does not remove a molecule from the “small molecule” class.Small molecules may also be incorporated into polymers, for example as apendent group on a polymer backbone or as a part of the backbone. Smallmolecules may also serve as the core moiety of a dendrimer, whichconsists of a series of chemical shells built on the core moiety. Thecore moiety of a dendrimer may be a fluorescent or phosphorescent smallmolecule emitter. A dendrimer may be a “small molecule,” and it isbelieved that all dendrimers currently used in the field of OLEDs aresmall molecules.

As used herein, “top” means furthest away from the substrate, while“bottom” means closest to the substrate. Where a first layer isdescribed as “disposed over” a second layer, the first layer is disposedfurther away from substrate. There may be other layers between the firstand second layer, unless it is specified that the first layer is “incontact with” the second layer. For example, a cathode may be describedas “disposed over” an anode, even though there are various organiclayers in between.

As used herein, “solution processable” means capable of being dissolved,dispersed, or transported in and/or deposited from a liquid medium,either in solution or suspension form.

A ligand may be referred to as “photoactive” when it is believed thatthe ligand directly contributes to the photoactive properties of anemissive material. A ligand may be referred to as “ancillary” when it isbelieved that the ligand does not contribute to the photoactiveproperties of an emissive material, although an ancillary ligand mayalter the properties of a photoactive ligand.

As used herein, and as would be generally understood by one skilled inthe art, a first “Highest Occupied Molecular Orbital” (HOMO) or “LowestUnoccupied Molecular Orbital” (LUMO) energy level is “greater than” or“higher than” a second HOMO or LUMO energy level if the first energylevel is closer to the vacuum energy level. Since ionization potentials(IP) are measured as a negative energy relative to a vacuum level, ahigher HOMO energy level corresponds to an IP having a smaller absolutevalue (an IP that is less negative). Similarly, a higher LUMO energylevel corresponds to an electron affinity (EA) having a smaller absolutevalue (an EA that is less negative). On a conventional energy leveldiagram, with the vacuum level at the top, the LUMO energy level of amaterial is higher than the HOMO energy level of the same material. A“higher” HOMO or LUMO energy level appears closer to the top of such adiagram than a “lower” HOMO or LUMO energy level.

As used herein, and as would be generally understood by one skilled inthe art, a first work function is “greater than” or “higher than” asecond work function if the first work function has a higher absolutevalue. Because work functions are generally measured as negative numbersrelative to vacuum level, this means that a “higher” work function ismore negative. On a conventional energy level diagram, with the vacuumlevel at the top, a “higher” work function is illustrated as furtheraway from the vacuum level in the downward direction. Thus, thedefinitions of HOMO and LUMO energy levels follow a different conventionthan work functions.

As used herein, a “red” sub-pixel, layer, material, region, or devicerefers to one that emits light in the range of about 580-700 nm; a“green” sub-pixel layer, material, region, or device refers to one thathas an emission spectrum with a peak wavelength in the range of about500-600 nm; a “blue” sub-pixel layer, material, or device refers to onethat has an emission spectrum with a peak wavelength in the range ofabout 400-500 nm; and a “yellow” sub-pixel, layer, material, region, ordevice refers to one that has an emission spectrum with a peakwavelength in the range of about 540-600 nm. In some arrangements,separate regions, layers, materials, regions, or devices may provideseparate “deep blue” and a “light blue” light. As used herein, inarrangements that provide separate “light blue” and “deep blue”, the“deep blue” component refers to one having a peak emission wavelengththat is at least about 4 nm less than the peak emission wavelength ofthe “light blue” component. Typically, a “light blue” component has apeak emission wavelength in the range of about 465-500 nm, and a “deepblue” component has a peak emission wavelength in the range of about400-470 nm, though these ranges may vary for some configurations.Similarly, a color altering layer refers to a layer that converts ormodifies another color of light to light having a wavelength asspecified for that color. For example, a “red” color filter refers to afilter that results in light having a wavelength in the range of about580-700 nm. In general there are two classes of color altering layers:color filters that modify a spectrum by removing unwanted wavelengths oflight, and color changing layers that convert photons of higher energyto lower energy.

As used herein, a “full-color” device, pixel, or other component refersto one that includes red, green, and blue components, and which iscapable of being configured to emit a range of light across the visiblespectrum. A “full-color” device may include multiple sub-pixels, each ofwhich may be configured to emit one or more colors of light. Forexample, a full-color pixel may include one or more red, green, blue,and/or yellow sub-pixels, each of which emits the corresponding light.For example, a red sub-pixel may emit red light as previously defined,which, in conjunction with the other sub-pixels, allows the pixel to bea full-color pixel. Full-color pixels or other components typically alsomay be capable of emitting white light, such as by activating multiplecolors of sub-pixels concurrently. In some cases, a full-color pixelalso may include a white or other multi-color sub-pixel or similarcomponent.

In contrast to a full-color device, pixel, or other component, a“single-color” sub-pixel or other component does not include multiplecomponents of different colors and typically emits light only within asingle color range. For example, a red single-color sub-pixel typicallyemits light within the red visible spectrum, i.e., 580-700 nm. Asingle-color sub-pixel will emit all, or essentially all, visible lightemitted by the sub-pixel within the associated spectrum range. That is,while a very small amount of energy emitted by a single-color sub-pixelwithin the visible spectrum may fall outside the associated color range,it will be a sufficiently small amount that the difference in color isnot noticeable to the human eye.

More details on OLEDs, and the definitions described above, can be foundin U.S. Pat. No. 7,279,704, which is incorporated herein by reference inits entirety.

SUMMARY

According to an embodiment, an organic light emitting diode/device(OLED) is also provided. The OLED can include an anode, a cathode, andan organic layer, disposed between the anode and the cathode. Accordingto an embodiment, the organic light emitting device is incorporated intoone or more device selected from a consumer product, an electroniccomponent module, and/or a lighting panel.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows an organic light emitting device.

FIG. 2 shows an inverted organic light emitting device that does nothave a separate electron transport layer.

FIG. 3 shows a schematic illustration of a device including a plasmonicOLED according to an embodiment disclosed herein.

FIGS. 4A-4D show examples of specific OLED architectures according tothe general structure shown in FIG. 3 as disclosed herein. FIG. 4A showsan OLED architecture including one plasmonic OLED and two non-plasmonicOLED devices arranged in a stack and connected in series. FIG. 4B showsthe OLED architecture from FIG. 4A including down conversion layers, andcolor filters. FIG. 4C shows the same architecture as FIG. 4B with anadditional element which modifies the radiation pattern of thesub-pixels in the device. FIG. 4D shows an example architecture withmultiple plasmonic OLED devices incorporated into the device stack thatwill render the sub-pixels for a display.

FIGS. 5A-5D show schematic depictions of device architectures where theplasmonic OLED features broad band emission according to embodimentsdisclosed herein. FIG. 5A shows a device in which broadband emissionfrom the plasmonic OLED is outcoupled as broad band light by theoutcoupling layer and then converted to individual sub-pixels by colorfilters. FIG. 5B shows a device having broadband emission from theplasmonic OLED that is outcoupled as broad band light by the outcouplinglayer and then converted to sub-pixel colors via down conversion layers.FIG. 5C shows a device having broadband emission from the plasmonic OLEDthat is outcoupled as broad band light by the outcoupling layer and thenconverted to individual sub-pixel colors by down conversion layers andcolor filters. FIG. 5D shows a device having broadband emission from theplasmonic OLED that is outcoupled as R, G, and B layer bycompositionally different outcoupling layers to generate individualsub-pixel colors.

DETAILED DESCRIPTION

Generally, an OLED comprises at least one organic layer disposed betweenand electrically connected to an anode and a cathode. When a current isapplied, the anode injects holes and the cathode injects electrons intothe organic layer(s). The injected holes and electrons each migratetoward the oppositely charged electrode. When an electron and holelocalize on the same molecule, an “exciton,” which is a localizedelectron-hole pair having an excited energy state, is formed. Light isemitted when the exciton relaxes via a photoemissive mechanism. In somecases, the exciton may be localized on an excimer or an exciplex.Non-radiative mechanisms, such as thermal relaxation, may also occur,but are generally considered undesirable.

The initial OLEDs used emissive molecules that emitted light from theirsinglet states (“fluorescence”) as disclosed, for example, in U.S. Pat.No. 4,769,292, which is incorporated by reference in its entirety.Fluorescent emission generally occurs in a time frame of less than 10nanoseconds.

More recently, OLEDs having emissive materials that emit light fromtriplet states (“phosphorescence”) have been demonstrated. Baldo et al.,“Highly Efficient Phosphorescent Emission from OrganicElectroluminescent Devices,” Nature, vol. 395, 151-154, 1998;(“Baldo-I”) and Baldo et al., “Very high-efficiency green organiclight-emitting devices based on electrophosphorescence,” Appl. Phys.Lett., vol. 75, No. 3, 4-6 (1999) (“Baldo-II”), are incorporated byreference in their entireties. Phosphorescence is described in moredetail in U.S. Pat. No. 7,279,704 at cols. 5-6, which are incorporatedby reference.

FIG. 1 shows an organic light emitting device 100. The figures are notnecessarily drawn to scale. Device 100 may include a substrate 110, ananode 115, a hole injection layer 120, a hole transport layer 125, anelectron blocking layer 130, an emissive layer 135, a hole blockinglayer 140, an electron transport layer 145, an electron injection layer150, a protective layer 155, a cathode 160, and a barrier layer 170.Cathode 160 is a compound cathode having a first conductive layer 162and a second conductive layer 164. Device 100 may be fabricated bydepositing the layers described, in order. The properties and functionsof these various layers, as well as example materials, are described inmore detail in U.S. Pat. No. 7,279,704 at cols. 6-10, which areincorporated by reference.

More examples for each of these layers are available. For example, aflexible and transparent substrate-anode combination is disclosed inU.S. Pat. No. 5,844,363, which is incorporated by reference in itsentirety. An example of a p-doped hole transport layer is m-MTDATA dopedwith F₄-TCNQ at a molar ratio of 50:1, as disclosed in U.S. PatentApplication Publication No. 2003/0230980, which is incorporated byreference in its entirety. Examples of emissive and host materials aredisclosed in U.S. Pat. No. 6,303,238 to Thompson et al., which isincorporated by reference in its entirety. An example of an n-dopedelectron transport layer is BPhen doped with Li at a molar ratio of 1:1,as disclosed in U.S. Patent Application Publication No. 2003/0230980,which is incorporated by reference in its entirety. U.S. Pat. Nos.5,703,436 and 5,707,745, which are incorporated by reference in theirentireties, disclose examples of cathodes including compound cathodeshaving a thin layer of metal such as Mg:Ag with an overlyingtransparent, electrically-conductive, sputter-deposited ITO layer. Thetheory and use of blocking layers is described in more detail in U.S.Pat. No. 6,097,147 and U.S. Patent Application Publication No.2003/0230980, which are incorporated by reference in their entireties.Examples of injection layers are provided in U.S. Patent ApplicationPublication No. 2004/0174116, which is incorporated by reference in itsentirety. A description of protective layers may be found in U.S. PatentApplication Publication No. 2004/0174116, which is incorporated byreference in its entirety.

FIG. 2 shows an inverted OLED 200. The device includes a substrate 210,a cathode 215, an emissive layer 220, a hole transport layer 225, and ananode 230. Device 200 may be fabricated by depositing the layersdescribed, in order. Because the most common OLED configuration has acathode disposed over the anode, and device 200 has cathode 215 disposedunder anode 230, device 200 may be referred to as an “inverted” OLED.Materials similar to those described with respect to device 100 may beused in the corresponding layers of device 200. FIG. 2 provides oneexample of how some layers may be omitted from the structure of device100.

The simple layered structure illustrated in FIGS. 1 and 2 is provided byway of non-limiting example, and it is understood that embodiments ofthe invention may be used in connection with a wide variety of otherstructures. The specific materials and structures described areexemplary in nature, and other materials and structures may be used.Functional OLEDs may be achieved by combining the various layersdescribed in different ways, or layers may be omitted entirely, based ondesign, performance, and cost factors. Other layers not specificallydescribed may also be included. Materials other than those specificallydescribed may be used. Although many of the examples provided hereindescribe various layers as comprising a single material, it isunderstood that combinations of materials, such as a mixture of host anddopant, or more generally a mixture, may be used. Also, the layers mayhave various sublayers. The names given to the various layers herein arenot intended to be strictly limiting. For example, in device 200, holetransport layer 225 transports holes and injects holes into emissivelayer 220, and may be described as a hole transport layer or a holeinjection layer. In one embodiment, an OLED may be described as havingan “organic layer” disposed between a cathode and an anode. This organiclayer may comprise a single layer, or may further comprise multiplelayers of different organic materials as described, for example, withrespect to FIGS. 1 and 2 .

Structures and materials not specifically described may also be used,such as OLEDs comprised of polymeric materials (PLEDs) such as disclosedin U.S. Pat. No. 5,247,190 to Friend et al., which is incorporated byreference in its entirety. By way of further example, OLEDs having asingle organic layer may be used. OLEDs may be stacked, for example asdescribed in U.S. Pat. No. 5,707,745 to Forrest et al, which isincorporated by reference in its entirety. The OLED structure maydeviate from the simple layered structure illustrated in FIGS. 1 and 2 .For example, the substrate may include an angled reflective surface toimprove out-coupling, such as a mesa structure as described in U.S. Pat.No. 6,091,195 to Forrest et al., and/or a pit structure as described inU.S. Pat. No. 5,834,893 to Bulovic et al., which are incorporated byreference in their entireties.

In some embodiments disclosed herein, emissive layers or materials, suchas emissive layer 135 and emissive layer 220 shown in FIGS. 1-2 ,respectively, may include quantum dots. An “emissive layer” or “emissivematerial” as disclosed herein may include an organic emissive materialand/or an emissive material that contains quantum dots or equivalentstructures, unless indicated to the contrary explicitly or by contextaccording to the understanding of one of skill in the art. Such anemissive layer may include only a quantum dot material which convertslight emitted by a separate emissive material or other emitter, or itmay also include the separate emissive material or other emitter, or itmay emit light itself directly from the application of an electriccurrent. Similarly, a color altering layer, color filter, upconversion,or downconversion layer or structure may include a material containingquantum dots, though such layer may not be considered an “emissivelayer” as disclosed herein. In general, an “emissive layer” or materialis one that emits an initial light, which may be altered by anotherlayer such as a color filter or other color altering layer that does notitself emit an initial light within the device, but may re-emit alteredlight of a different spectra content based upon initial light emitted bythe emissive layer.

Unless otherwise specified, any of the layers of the various embodimentsmay be deposited by any suitable method. For the organic layers,preferred methods include thermal evaporation, ink-jet, such asdescribed in U.S. Pat. Nos. 6,013,982 and 6,087,196, which areincorporated by reference in their entireties, organic vapor phasedeposition (OVPD), such as described in U.S. Pat. No. 6,337,102 toForrest et al., which is incorporated by reference in its entirety, anddeposition by organic vapor jet printing (OVJP), such as described inU.S. Pat. No. 7,431,968, which is incorporated by reference in itsentirety. Other suitable deposition methods include spin coating andother solution based processes. Solution based processes are preferablycarried out in nitrogen or an inert atmosphere. For the other layers,preferred methods include thermal evaporation. Preferred patterningmethods include deposition through a mask, cold welding such asdescribed in U.S. Pat. Nos. 6,294,398 and 6,468,819, which areincorporated by reference in their entireties, and patterning associatedwith some of the deposition methods such as ink jet and OVJD. Othermethods may also be used. The materials to be deposited may be modifiedto make them compatible with a particular deposition method. Forexample, substituents such as alkyl and aryl groups, branched orunbranched, and preferably containing at least 3 carbons, may be used insmall molecules to enhance their ability to undergo solution processing.Substituents having 20 carbons or more may be used, and 3-20 carbons isa preferred range. Materials with asymmetric structures may have bettersolution processability than those having symmetric structures, becauseasymmetric materials may have a lower tendency to recrystallize.Dendrimer substituents may be used to enhance the ability of smallmolecules to undergo solution processing.

Devices fabricated in accordance with embodiments of the presentinvention may further optionally comprise a barrier layer. One purposeof the barrier layer is to protect the electrodes and organic layersfrom damaging exposure to harmful species in the environment includingmoisture, vapor and/or gases, etc. The barrier layer may be depositedover, under or next to a substrate, an electrode, or over any otherparts of a device including an edge. The barrier layer may comprise asingle layer, or multiple layers. The barrier layer may be formed byvarious known chemical vapor deposition techniques and may includecompositions having a single phase as well as compositions havingmultiple phases. Any suitable material or combination of materials maybe used for the barrier layer. The barrier layer may incorporate aninorganic or an organic compound or both. The preferred barrier layercomprises a mixture of a polymeric material and a non-polymeric materialas described in U.S. Pat. No. 7,968,146, PCT Pat. Application Nos.PCT/US2007/023098 and PCT/US2009/042829, which are herein incorporatedby reference in their entireties. To be considered a “mixture”, theaforesaid polymeric and non-polymeric materials comprising the barrierlayer should be deposited under the same reaction conditions and/or atthe same time. The weight ratio of polymeric to non-polymeric materialmay be in the range of 95:5 to 5:95. The polymeric material and thenon-polymeric material may be created from the same precursor material.In one example, the mixture of a polymeric material and a non-polymericmaterial consists essentially of polymeric silicon and inorganicsilicon.

Devices fabricated in accordance with embodiments of the invention canbe incorporated into a wide variety of electronic component modules (orunits) that can be incorporated into a variety of electronic products orintermediate components. Examples of such electronic products orintermediate components include display screens, lighting devices suchas discrete light source devices or lighting panels, etc. that can beutilized by the end-user product manufacturers. Such electroniccomponent modules can optionally include the driving electronics and/orpower source(s). Devices fabricated in accordance with embodiments ofthe invention can be incorporated into a wide variety of consumerproducts that have one or more of the electronic component modules (orunits) incorporated therein. A consumer product comprising an OLED thatincludes the compound of the present disclosure in the organic layer inthe OLED is disclosed. Such consumer products would include any kind ofproducts that include one or more light source(s) and/or one or more ofsome type of visual displays. Some examples of such consumer productsinclude flat panel displays, computer monitors, medical monitors,televisions, billboards, lights for interior or exterior illuminationand/or signaling, heads-up displays, fully or partially transparentdisplays, flexible displays, laser printers, telephones, mobile phones,tablets, phablets, personal digital assistants (PDAs), wearable devices,laptop computers, digital cameras, camcorders, viewfinders,micro-displays (displays that are less than 2 inches diagonal), 3-Ddisplays, virtual reality or augmented reality displays, vehicles, videowalls comprising multiple displays tiled together, theater or stadiumscreen, and a sign. Various control mechanisms may be used to controldevices fabricated in accordance with the present invention, includingpassive matrix and active matrix. Many of the devices are intended foruse in a temperature range comfortable to humans, such as 18 C to 30 C,and more preferably at room temperature (20-25 C), but could be usedoutside this temperature range, for example, from −40 C to 80 C.

The materials and structures described herein may have applications indevices other than OLEDs. For example, other optoelectronic devices suchas organic solar cells and organic photodetectors may employ thematerials and structures. More generally, organic devices, such asorganic transistors, may employ the materials and structures.

In some embodiments, the OLED has one or more characteristics selectedfrom the group consisting of being flexible, being rollable, beingfoldable, being stretchable, and being curved. In some embodiments, theOLED is transparent or semi-transparent. In some embodiments, the OLEDfurther comprises a layer comprising carbon nanotubes.

In some embodiments, the OLED further comprises a layer comprising adelayed fluorescent emitter. In some embodiments, the OLED comprises aRGB pixel arrangement or white plus color filter pixel arrangement. Insome embodiments, the OLED is a mobile device, a hand held device, or awearable device. In some embodiments, the OLED is a display panel havingless than 10 inch diagonal or 50 square inch area. In some embodiments,the OLED is a display panel having at least 10 inch diagonal or 50square inch area. In some embodiments, the OLED is a lighting panel.

In some embodiments of the emissive region, the emissive region furthercomprises a host.

In some embodiments, the compound can be an emissive dopant. In someembodiments, the compound can produce emissions via phosphorescence,fluorescence, thermally activated delayed fluorescence, i.e., TADF (alsoreferred to as E-type delayed fluorescence), triplet-tripletannihilation, or combinations of these processes.

The OLED disclosed herein can be incorporated into one or more of aconsumer product, an electronic component module, and a lighting panel.The organic layer can be an emissive layer and the compound can be anemissive dopant in some embodiments, while the compound can be anon-emissive dopant in other embodiments.

The organic layer can also include a host. In some embodiments, two ormore hosts are preferred. In some embodiments, the hosts used maybe a)bipolar, b) electron transporting, c) hole transporting or d) wide bandgap materials that play little role in charge transport. In someembodiments, the host can include a metal complex. The host can be aninorganic compound.

Combination with Other Materials

The materials described herein as useful for a particular layer in anorganic light emitting device may be used in combination with a widevariety of other materials present in the device. For example, emissivedopants disclosed herein may be used in conjunction with a wide varietyof hosts, transport layers, blocking layers, injection layers,electrodes and other layers that may be present. The materials describedor referred to below are non-limiting examples of materials that may beuseful in combination with the compounds disclosed herein, and one ofskill in the art can readily consult the literature to identify othermaterials that may be useful in combination.

Various materials may be used for the various emissive and non-emissivelayers and arrangements disclosed herein. Examples of suitable materialsare disclosed in U.S. Patent Application Publication No. 2017/0229663,which is incorporated by reference in its entirety.

Conductivity Dopants:

A charge transport layer can be doped with conductivity dopants tosubstantially alter its density of charge carriers, which will in turnalter its conductivity. The conductivity is increased by generatingcharge carriers in the matrix material, and depending on the type ofdopant, a change in the Fermi level of the semiconductor may also beachieved. Hole-transporting layer can be doped by p-type conductivitydopants and n-type conductivity dopants are used in theelectron-transporting layer.

HIL/HTL:

A hole injecting/transporting material to be used in the presentinvention is not particularly limited, and any compound may be used aslong as the compound is typically used as a hole injecting/transportingmaterial.

EBL:

An electron blocking layer (EBL) may be used to reduce the number ofelectrons and/or excitons that leave the emissive layer. The presence ofsuch a blocking layer in a device may result in substantially higherefficiencies, and or longer lifetime, as compared to a similar devicelacking a blocking layer. Also, a blocking layer may be used to confineemission to a desired region of an OLED. In some embodiments, the EBLmaterial has a higher LUMO (closer to the vacuum level) and/or highertriplet energy than the emitter closest to the EBL interface. In someembodiments, the EBL material has a higher LUMO (closer to the vacuumlevel) and or higher triplet energy than one or more of the hostsclosest to the EBL interface. In one aspect, the compound used in EBLcontains the same molecule or the same functional groups used as one ofthe hosts described below.

Host:

The light emitting layer of the organic EL device of the presentinvention preferably contains at least a metal complex as light emittingmaterial, and may contain a host material using the metal complex as adopant material. Examples of the host material are not particularlylimited, and any metal complexes or organic compounds may be used aslong as the triplet energy of the host is larger than that of thedopant. Any host material may be used with any dopant so long as thetriplet criteria is satisfied.

HBL:

A hole blocking layer (HBL) may be used to reduce the number of holesand/or excitons that leave the emissive layer. The presence of such ablocking layer in a device may result in substantially higherefficiencies and/or longer lifetime as compared to a similar devicelacking a blocking layer. Also, a blocking layer may be used to confineemission to a desired region of an OLED. In some embodiments, the HBLmaterial has a lower HOMO (further from the vacuum level) and or highertriplet energy than the emitter closest to the HBL interface. In someembodiments, the HBL material has a lower HOMO (further from the vacuumlevel) and or higher triplet energy than one or more of the hostsclosest to the HBL interface.

ETL:

An electron transport layer (ETL) may include a material capable oftransporting electrons. The electron transport layer may be intrinsic(undoped), or doped. Doping may be used to enhance conductivity.Examples of the ETL material are not particularly limited, and any metalcomplexes or organic compounds may be used as long as they are typicallyused to transport electrons.

Charge Generation Layer (CGL)

In tandem or stacked OLEDs, the CGL plays an essential role in theperformance, which is composed of an n-doped layer and a p-doped layerfor injection of electrons and holes, respectively. Electrons and holesare supplied from the CGL and electrodes. The consumed electrons andholes in the CGL are refilled by the electrons and holes injected fromthe cathode and anode, respectively; then, the bipolar currents reach asteady state gradually. Typical CGL materials include n and pconductivity dopants used in the transport layers.

When an emissive material such as the emitters disclosed herein isplaced in an environment with an increased density of photonic statesrelative to vacuum, the emission rate of the material typicallyincreases due to a phenomenon known as the Purcell effect. The enhancedradiative and non-radiative rates decrease the length of time theemitter stays in the excited state, thereby stabilizing the emitter andreducing the aging rate of the emissive material and, as a result, theOLED device as a whole. It is believed that obtaining relatively largePurcell enhancements typically requires placing the emissive materialclose to a metal film or other plasmonically-active enhancement layer.Such configurations are described, for example, in U.S. Pat. No.9,960,386, the disclosure of which is incorporated by reference in itsentirety. As used herein, a “plasmonic OLED” refers to an OLED thatincludes an enhancement layer that includes a plasmonic material whichexhibits surface plasmon resonance that non-radiatively couples to anorganic emissive material in the OLED, and transfers excited stateenergy from the emissive material to non-radiative mode of surfaceplasmon polaritons. The he enhancement layer typically is provided nomore than a threshold distance away from the second organic emissivelayer as previously disclosed and defined. Such arrangements may be mostimportant for emissive materials within a threshold distance of theenhancement layer, where the relevant threshold distance may be definedas the distance from the enhancement layer at which the total radiativedecay rate constant is equal to the total non-radiative decay rateconstant. Typically the energy coupled into the enhancement layer islost as heat unless the device also incorporates an outcoupling layer.Embodiments disclosed herein provide techniques and arrangements thatallow for the enhancement layer and/or an outcoupling layer to beincorporated into OLED displays and other devices.

Typical manufacturing methods for OLED displays usually involvepatterning of the sub-pixels by controlling the materials deposited onthe display for each sub-pixel (often referred to as side-by-sidefabrication), or depositing a uniform OLED stack over the entire backplane and then later patterning the sub-pixels with elements such ascolor filters or down conversion layers. A uniform OLED stack oftenincludes one or more blanket OLED depositions that are deposited acrossone or more underlying electrodes without interruption. These approachesalso may be combined in various forms. Examples of these and relatedfabrication techniques and device arrangements are described, forexample, in U.S. Pat. Nos. 9,385,168, 9,590,017, 9,424,772, 10,243,023,10,304,906, and 10,229,956 and U.S. Pub. Nos. 2015/0349034 and2015/0349032, the disclosure of each of which is incorporated byreference in its entirety.

OLED displays which have a uniform OLED stack over the entire back planeoften have stacked OLED devices in them. For example, current TVarchitectures often use 3 OLEDs stacked in series to provide awhite-emitting device. From the uniform white stacked OLED deposition, 4sub-pixels are then patterned—a red sub-pixel, a green sub-pixel, a bluesub-pixel, and a white sub-pixel, for example by using masks, coloraltering layers such as color filters, and the like. As another example,blue OLED devices may be stacked to generate very bright blue lightwhich may be converted to red and/or green sub-pixels by down conversionlayers disposed in a stack with the blue device, thereby rendering adisplay with red (R), green (G), and blue (B) (RGB) sub-pixels.Embodiments disclosed herein provide methods and arrangements to achievea plasmonic OLED incorporated with such devices to utilize theenhancement in lifetime of the plasmonic OLED in combination with thestacked structures to benefit displays in a number of ways.

FIG. 3 shows a schematic representation of the basic structure of adevice as provided herein. The device includes a plasmonic OLED 350 andzero or more, typically one or more, non-plasmonic OLEDs 360, 361. Asused herein, a “non-plasmonic” OLED may be an OLED such as describedwith respect to FIGS. 1 and 2 , or any other OLED device that does notrestrict the arrangement of components in the device to meet therequirements defined for an “enhancement layer” as described herein. Theplasmonic OLED 350 is provided by an emissive stack that includes outerconductive layers 351, 353 with an emissive stack 352 disposed betweenthem. As used herein, an “emissive stack” refers to a stack of layers orother components that provide at least the minimum layers and componentsto emit light, typically including conductive layers and at least anemissive layer disposed between them. Each “emissive stack” 352, 362,363 may also include any or all of the other organic and other layersdisclosed herein, such as with reference to FIGS. 1 and 2 , includingbut not limited to blocking layers, transport layers, spacing layers,and the like. In a common device structure the outer-most conductivelayers 351, 367 are electrodes. An “emissive stack” in conjunction withthe surrounding conductive layers provides a functional OLED device,even if it is contained within a larger device as shown, which mayinclude multiple OLEDs, each having a corresponding emissive stack. Eachof the conductive layers 351, 353 may be an electrode that includes anelectrical connection that extends externally to the device, or a chargegenerating layer that does not include an external connection butprovides the same functionality as an electrode, i.e., generation ofcharges within the OLED. Similarly, non-plasmonic OLEDs 360, 361 areeach defined by outer conductive layers and an emissive stack betweenthem. The first non-plasmonic OLED 360 includes an emissive stack 362disposed between the outer conductive layers 353, 364, and the secondnon-plasmonic OLED includes an emissive stack 363 disposed between outerconductive layers 364, 367. As with the plasmonic OLED 350, each of theconductive layers 353, 364, 367 may be an electrode or an internalcharge generation layer. Conductive layers may be shared between twoadjacent emissive stacks. In this example, the conductive layer 353 maybe a charge generation layer that provides electrode-like functionalityto the emissive stack 352 of the plasmonic OLED 350 as well as theemissive stack 362 of the adjacent non-plasmonic OLED 360. One or moreof the conductive layers 351, 353, 364, 367 may function as anenhancement layer for a plasmonic OLED in the device, such as OLED 350.In this example structure, the conductive layer 351 may be an electrodethat is also the enhancement layer for the plasmonic OLED 350. Each ofthe devices may be described as a “stack”, and the devices as a wholemay be described as being arranged in a “stacked configuration” sincethey at least partially overlap one another vertically (i.e., in adirection from the lower-most conductive layer 367 to the upperconductive layer 351). Generally the outer-most conductive layers 351,367 will be electrodes for the stacked device. Typically the conductivelayer 367 closest to the substrate is an anode and the upper layer 351is a cathode, but inverted arrangements may be used in which the lowerlayer 367 is the cathode for the device. Internal conductive layers suchas layers 353, 364 typically are charge generation layers that aredisposed between emissive layers of each of the OLEDs, and, morespecifically, between the emissive stacks 352, 362, 363 that include oneor more emissive layers and any other layers in each OLED. Other layersand components may be disposed above the conductive layer 351, such asoutcoupling layers, color filters, down conversion layers, and the like.Furthermore, one or more additional layers 390 may be disposed below thesubstrate, i.e., opposite the substrate from the emissive stacks 350,360, 361 or, more generally, on an opposite side of a substrate from oneor more emissive layers in any of the structures disclosed herein. Suchlayers 390 may include, for example, one or more outcoupling layers,color filters, down conversion layers, up conversion layers, radiationpattern modifying elements, or any other color altering or similar layeras disclosed herein, including any of the materials or structures asdisclosed herein for use in such layers. Examples of such structures aredescribed in further detail herein, any of which may be used for theadditional layer or layers 390 as shown. For example, any of the layersand structures shown herein, including but not limited to layers andcomponents 305, 370, 365, 375, 565, 566, 567, 571, 572, 573, andcombinations and variations thereof.

As disclosed in further detail herein with respect to examplearrangements of the basic architecture shown in FIG. 3 , devicesprovided herein may include various components and layers that operateas part of, or in conjunction with, one or more plasmonic and/ornon-plasmonic OLEDs in a stacked device. Various features of thesecomponents will now be described. Unless specifically indicated to thecontrary or prohibited by the physical requirements or constraints ofindividual features, each feature may be used in conjunction with eachother feature without departing from the scope and content of thepresent disclosure. In addition, unless explicitly described to thecontrary, any of the devices and arrangements disclosed herein, whetherplasmonic or non-plasmonic OLEDs, may include any or all of the layersand structures described with respect to FIGS. 1 and 2 , including butnot limited to emissive layers, transport layers, blocking layers, coloraltering layers such as color filters, up- or down-conversion layers,quantum dot structures, charge generating layers, electrodes, andsubstrates.

An outcoupling layer or component as disclosed herein may be periodic,quasi-periodic, or have no periodicity, including a random physicalarrangement. It may include dielectric materials, metals, orsemiconducting materials or combinations of these materials. In someconfigurations an outcoupling layer may include an additional coating tochange the radiation pattern, as described herein with respect to aradiation pattern changing element. Alternatively or in addition, anoutcoupling layer may have a coating to lower the reflectivity of thelayer or the device as a whole.

Each emissive layer (EML) disclosed herein, whether incorporated into aplasmonic OLED emissive stack or a non-plasmonic OLED emissive stack,may include one or more or more emissive materials. Each emissivematerial may emit monochromatic or multi-colored light, examples ofwhich include, but are not limited to, red and green emissive materialsto provide yellow emission, blue and red emissive materials to providewhite emission, blue and red and green to make white emission, or blue,red, green and/or yellow to provide white emission. Similarly, eachemissive stack may include multiple separate emissive layers to achievethe same effects. Each emissive material may be fluorescent,phosphorescent, or thermally activated delayed fluorescent (TADF)materials or combinations of these types of materials. Similarly, eachemissive stack in each device disclosed herein may use any combinationof fluorescent, phosphorescent, and/or TADF materials.

Each OLED and each OLED stack that includes multiple OLEDS may be abottom-emitting, top-emitting, or two-sided device. A bottom-emittingdevice is one that emits through the substrate on which the device isstacked, whereas a top-emitting device emits light primarily through theopposite side of the device. A two-sided device emits through bothsurfaces of the OLED or device. These devices may be used in anycombination within any individual device. For example, a top-mostemissive stack may be top-emitting, while stacks lower in the device(i.e., closer to the substrate) may have two-sided emission. Variousreflective and transmissive materials and layers may be used to achieveany desired type of emission, as is understood in the art with respectto conventional OLED structures. In some cases, the arrangement ofemissive stacks and devices may be inverted from the examples shown inFIGS. 3-5 . For example, for a bottom-emitting device, a plasmonic OLEDmay be arranged closer to the substrate with one or more non-plasmonicOLEDs stacked above it, and any outcoupling layer or component may bearranged below the anode instead of above it where the anode acts as theenhancement layer for the plasmonic OLED. Alternatively or in addition,in some configurations the electrodes may be inverted from the examplesshown, such that the cathode is located below the emissive stacks andthe anode is the upper-most conductive layer.

Each down conversion layer or component as disclosed herein may includeone or more materials, including fluorescent emitters, inorganicphosphors, organic phosphors, and/or quantum dots. More generally, adown conversion layer or component may include any material that absorbsphotons and re-emits photons at a lower energy than was absorbed by thematerial. Down conversion layers may be blanket layers that extendunbroken across multiple sub-pixels, or they may be patterned over onlyone or more sub-pixels within a device.

A plasmonic outcoupling layer as disclosed herein, such as layers 305,571, 572, and 573 may include a variety of structures. Examples ofsuitable outcoupling structures include, but are not limited to,gratings or corrugation, nanopatch antennas or other nanoparticle-basedoutcoupling schemes, and through-hole arrays. Alternatively or inaddition an outcoupling layer may include a voltage-tunable refractiveindex material, which may be used in conjunction with another electrodewhich allows for tuning of the outcoupling color based on an externalvoltage. Alternatively or in addition to these outcoupling structures,some devices may include conventional outcoupling structures such asmicrolens sheets, outcoupling grids or lenses, or the like.

Each charge generation layer disclosed herein may include metallicmaterials and any other material or structure known in the art forcharge generation in conventional OLEDs. Alternatively or in addition, acharge generation layer may include other components such as, but notlimited to, spun-on nanoparticles, nanoparticles made by growing a metalslowly so that it de-wets, or by laminating a metal film. Laminated CGLsstructures may include arrays of particles, pseudo-periodic and randomlyoriented nanoparticles, and through-hole arrays of a metal or a metalalloy. A CGL may be composed of a single component or it may include amixed layer of organic material which has dielectric or metalnanoparticles embedded in it, or it may include sub-layers in anycombination of these materials.

A radiation pattern modifying element as disclosed herein may converts aradiation pattern from non-Lambertian to Lambertian, or from Lambertianto non-Lambertian (such as for applications where a certain angulardependence is desired), or more generally alters the angular dependenceof an attribute of light emitted by a device. Examples of componentsthat may be used to provide a radiation pattern modifying elementinclude nanopatch antennas and components including an equivalentnanopatch structure, semi-transparent metals, and distributed Braggreflectors

Each stacked device including multiple emissive stacks, and eachindividual emissive stack, may emit any desired color of light. Forexample, a plasmonic or non-plasmonic OLED may emit red, green, blue,yellow, white, or any other desired color. Light emitted by an emissivestack within a stacked device may be emitted by the device unchanged, orit may be changed through the use of color filters, down conversionlayers, up conversion layers, and other structures as disclosed hereinto achieve a desired emission spectrum for the device. A stacked devicemay provide a single sub-pixel within a pixel structure of a displaypanel, or a single stacked device structure may provide multiplesub-pixels as disclosed in various examples herein and as generallyknown in the art with respect to conventional stacked devices. In somecases it may be preferred for a plasmonic OLED as disclosed herein toemit blue light and/or to include a blue emissive material in theemissive layer, since blue-emitting devices typically are the limitingfactor for device lifetime. Display panels using the device structuresdisclosed herein may include any desired combination of colors ofsub-pixels, including 3- and 4-sub-pixel arrangements, white sub-pixels,red-green-blue (RGB) side-by-side arrangements, arrangements includingtwo blue sub-pixels (RGB1B2-type devices). Devices may include a limitednumber of colors of emissive materials, such as where only two or threecolors of emissive materials are used and color altering layers andcomponents are used to provide other colors in a full-color pixel.

Specific examples of arrangements having the basic structure shown inFIG. 3 will now be described with respect to FIGS. 4-5 . Any of thespecific features, components, and layers shown in FIGS. 4-5 may be usedin conjunction with any other features, components, and layers unlessspecifically indicated to the contrary, or unless such combination isphysically prohibited based on the description and requirements of each.Furthermore, additional layers and components may be used in any of thedevices shown in FIGS. 4-5 , including but not limited to one or moreadditional layers disposed on an opposite side of a substrate from oneor more emissive stacks, as described with respect to FIG. 3 .

FIG. 4A shows a schematic illustration of a plasmonic OLED that isstacked in series with one or more non-plasmonic OLEDs as disclosedherein. As shown, a device as provided herein may include anon-plasmonic OLED structure 360, which includes outer electrodes 330,340 with one or more layer 335 disposed between them. The non-plasmonicOLED may be a stacked structure that includes multiple OLED structureswithin it. For example, the non-plasmonic OLED structure shown in FIG.4A includes two non-plasmonic OLEDs arranged in a stack. The first isdefined by outer electrodes 330, 340, with an emissive layer 335disposed between them. A second non-plasmonic OLED is defined by outerconductive layers 320, 330, with emissive layer 322 disposed betweenthem. Each non-plasmonic OLED may include any or all of the other layersdisclosed with respect to FIGS. 1 and 2 or, more generally, any layer orstructure suitable for use in an OLED as known in the art. As shown inFIG. 4A, plasmonic and non-plasmonic OLEDs disclosed herein may useelectrodes 310, 340 that provide external electrical connections, orthey may use charge generation layers 320, 330 to provide electrode-likefunctionality, as is known in the art. A plasmonic OLED 350 may includeone or more electrodes or equivalent layers 310, 320, with one or moreemissive layers 315 disposed between them. The plasmonic andnon-plasmonic OLEDs may be arranged in a stack over a substrate (notshown). As used herein, two devices, layers, or other components may bearranged “in a stack” or in a “stacked” configuration where one isdisposed at least partly over the other relative to a substrate or othercommon layer. In contrast to a stacked configuration, two components maybe described as being arranged in a plane or in a side-by-sideconfiguration where there is no overlap of the components along any andall vertical lines drawn through one of the components.

More generally, arrangements disclosed herein may include one or moreplasmonic OLEDs and zero or more non-plasmonic OLEDs incorporated into acommon display architecture. As previously disclosed, a plasmonic OLEDincludes an enhancement layer. In the example structure shown in FIG.4A, the cathode 310 acts as both an electrical contact as well as theenhancement layer for the plasmonic OLED 350. Light emitted by emissivelayers in one or more non-plasmonic OLEDs 360, such as EMLs 322, 335,may be transmitted by the plasmonic OLED 360 and an outcouplingstructure 305, if present, as disclosed in further detail herein.

Devices disclosed herein may include additional structures that operatein conjunction with the plasmonic and/or non-plasmonic OLEDs. Forexample, FIG. 4B shows the same device as FIG. 4A with a down conversionlayer 365 and red, green, and blue color filters 370. The downconversion layers can include fluorescent emitters, inorganic phosphors,organic phosphors, quantum dots, or any other element which absorbsphotons and re-emits photons at lower energy. A device as shown in FIG.4B may include a down conversion layer that is uniformly deposited overall sub-pixels as shown, or it may be patterned over one or moresub-pixels. For example, where one or more of the OLEDs emits bluelight, red and green down conversion and/or color filter layers may bedisposed over the red and green sub-pixels, while a blue sub-pixel usesonly the unfiltered light provided by the blue emissive devices. Whensuch a layer is patterned over one or more sub-pixels, its compositionmay vary between sub-pixels. Various configurations may use any numberof color filters in addition to the down conversion layer, or the downconversion layer may be used without associated color filters. Eachsub-pixel may have a different configuration, such that each may includea down conversion layer and/or a color filter regardless of thestructure used for other sub-pixels, in any combination.

As another example, devices disclosed herein may include a radiationpattern changing element. FIG. 4C shows the same device as in FIG. 4Bwith the addition of a radiation pattern changing element to modify theangular dependence of the display. As with the down conversion and colorfilter components, the radiation pattern changing element 375 may beuniformly deposited over the display or patterned over one or moresub-pixels, individually or concurrently. The radiation patternmodifying element composition does not have to be the same over all thesub-pixels, and may vary between pixels or between stacked OLED deviceswithin a single display panel. Further, the radiation pattern modifyingelement may be used to convert the radiation pattern from non-Lambertianto Lambertian, or from Lambertian to non-Lambertian for applicationswhere a certain angular dependence is desired. For example, the element375 may include a nanopatch antenna out-coupling mechanism to convertthe plasmon energy into photons, which results in a near-Lambertianemission profile. In certain mobile display applications where someangular dependence is desired, the radiation pattern modifying elementmay be used to form a cavity atop the plasmon out-coupling mechanism.The element may include, for example, a semi-transparent metal or adistributed Bragg reflector to establish the desired cavity effect. Theelement 375 may be used alone or in conjunction with one or more of thecomponents described with respect to FIG. 4B, in any combination.

As previously disclosed, one or more plasmonic OLEDs may be arranged ina stack with zero or more non-plasmonic OLEDs. FIG. 4D shows a schematicdepiction of a device that includes two plasmonic OLED devices 350, 380arranged in a stack with a non-plasmonic OLED 360. As shown the devicemay include electrodes and charge generation layers that define theboundaries of each OLED in the stack. In this example, the cathode 310acts as an enhancement layer for the emissive layer 410 in the firstplasmonic OLED 350, and a charge generation layer 420 acts as anenhancement layer and outcoupling layer for the emissive layer 430 inthe second plasmonic OLED 380 as well as a CGL for the device stack. Theexample shown in FIG. 4D includes a down conversion layer and colorfilters as previously disclosed as an example, but more generally zeroor more down conversion layers color filters, outcoupling components,and/or radiation pattern changing elements may be used as previouslydisclosed.

In some cases a plasmonic OLED 380 may have a lower efficiency comparedto other plasmonic OLEDs in different stack structures. This may occurwhen light outcoupled from the non-plasmonic OLED 360 needs to passthrough either the charge generation layer 440 and the anode 460 for abottom-emitting device, or through the cathode 310 for a top-emittingdevice. The transmission of these layers is likely lower than 100%, thuslowering the efficiency of the plasmonic OLED 380 formed with EML2 430.

In some cases it may be desirable to use plasmonic OLEDs that haveemission spectra that have a large spectral width. Such devices canrender a display with multiple sub-pixels directly. Examples of devicesthat include structures with combinations of plasmonic OLEDs that canrender multiple sub-pixels and non-plasmonic OLEDs are schematicallyshown in FIGS. 5A-5C.

FIG. 5A shows an example device structure that includes one plasmonicOLED and two non-plasmonic OLEDs, much like the structures describedwith respect to FIGS. 4A-4C. The plasmonic OLDD may include aphosphorescent or other emissive layer 315, which may include one ormore emissive materials that emit multi-colored light. The light emittedby the plasmonic EML 315 in the OLED 350 may be converted to provide twoor more sub-pixels, such as by using a layer of one or more colorfilters 370. As previously disclosed, although FIG. 5A shows twonon-plasmonic OLEDs 360 for illustration purposes, more generally adevice as shown in FIG. 5A may include zero or more non-plasmonic OLEDs.The conversion of light from the plasmonic OLED having a relativelylarge spectral width may be accomplished by, for example, a broad bandoutcoupling structure in which the outcoupled emission is then convertedto spectrally-pure colors by one or more color filters, down-conversionlayers, or a combination, such as previously disclosed and as shown inFIGS. 5A-5C. For example, FIG. 5B shows an arrangement in which a singleoutcoupling layer 305 is used to outcouple light generated in theplasmonic OLED 350, but individual down conversion layers 565 are usedto generate red, green, and blue light from corresponding sub-pixels.FIG. 5C shows the same device, where individual sub-pixels includecombined color filter and down conversion components 566. Suchcomponents may be provided in a single layer with the components beingarranged side by side, or they may be provided in two or more separatelayers. In some embodiments color filters or down conversion layers mayinclude an additional coating, or an additional layer or component maybe used, to change the radiation pattern as previously disclosed.

In some configurations, sub-pixel colors may be rendered by outcouplingspecific spectral regions. For example, a white-emitting plasmonic OLEDmay be outcoupled into red, green, and blue sub-pixels by using afixed-pitch grating through changing the refractive index of thematerial coating the grating such that the dispersion relationpreferentially scatters red, green, or blue light normal to thesubstrate. A schematic depiction of such an embodiment is shown in FIG.5D. In this arrangement, the composition of the outcoupling layer 567may be different for each sub-pixel, such that the red, green, and bluesub-pixels are defined by the corresponding outcoupling layers 571, 572,573, respectively. In some embodiments, the difference between theoutcoupling components and/or materials could be small. For example, alloutcoupling layers may have a 300 nm pitch grating with the bluesub-pixel outcoupling layer 573 having no coating, while the redoutcoupling layer 571 may have a 1 micrometer thick coating of amaterial with a refractive index of 1.7. Other example outcouplingmechanisms for selecting specific wavelength ranges include, but are notlimited to, nanopatch antennas or other nanoparticle-based outcouplingschemes, and through-hole arrays.

In some configurations, it may be desirable to use specific materials orcombinations of materials to achieve specific effects. For example, itmay be desirable to balance charge distribution and injection within aplasmonic OLED, and specifically for a phosphorescent plasmonic OLED.One way to avoid a large charge increase when switching the plasmonicenhancement layer from Al to Ag or other more plasmonically activematerials, is to use an electron injection layer such as Yb or an alloyor oxide thereof, which works with common plasmonically-active materialssuch as Mg and Ag. Alternatively or in addition, adhesion layers may beused that also act as charge injection layers, such as Mg, Al, Ni, andTi layers. As a specific example, a 10 angstrom layer of Al inconjunction with a layer of Ag may be used. It may be preferred foradhesion layers to be between 2 and 60 angstroms thick; more preferablybetween 5 and 30 angstroms, or more preferably between 5 and 20angstroms.

It also may be desirable to balance charge within the device, becauseeven in devices that are stabilized by coupling to the plasmon mode of ametal, if charge balance is lost the lifetime of the device may bereduced. Various techniques may be used to maintain a desirable chargebalance, including using a lower electron mobility electron transportlayer, such as AlQ3. As another example, the thickness of a holeblocking layer may be increased to reduce the speed of electroninjection from an electron transport layer to an emissive layer. Asanother example, a hole blocking material with a relatively higher LUMOmay be used to add an electron injection barrier or within the emissivelayer to reduce electron injection and/or mobility in the emissivelayer. Alternatively or in addition, a higher-HOMO electron blockingmaterial may be used to reduce the hole injection barrier into theemissive layer. As another example, the proportion of e-type host withinthe emissive layer may be reduced to lower electron mobility within theemissive layer. As another example, a relatively thin hole transportlayer may be used and/or the percentage of emissive material in a dopedEML may be increased to increase hole mobility within the device. Italso may be desirable to maintain a high-quality enhancement layer toimprove the performance of the plasmonic OLED. Specific examples includeAg films having growth rates of 0.1 to 10 Å/s, more preferably 0.5 to2.5 Å/s. Any or all of these approaches may be used individually or inconjunction with any other approaches to achieve a stable, efficientplasmonic OLED.

It is understood that the various embodiments described herein are byway of example only, and are not intended to limit the scope of theinvention. For example, many of the materials and structures describedherein may be substituted with other materials and structures withoutdeviating from the spirit of the invention. The present invention asclaimed may therefore include variations from the particular examplesand preferred embodiments described herein, as will be apparent to oneof skill in the art. It is understood that various theories as to whythe invention works are not intended to be limiting.

We claim:
 1. A device comprising: a first non-plasmonic organic lightemitting diode (OLED) stack, the first non-plasmonic OLED stackcomprising: a first electrode; a first charge generation layer; and afirst organic emissive layer disposed between the first electrode andthe first charge generation layer; a second non-plasmonic OLED stackdisposed over the first non-plasmonic OLED stack, the secondnon-plasmonic OLED stack comprising: a second electrode; a second chargegeneration layer; and a second organic emissive layer disposed betweenthe second electrode and the second charge generation layer; and aplasmonic OLED stack, disposed between the first and secondnon-plasmonic OLED stacks, the plasmonic OLED stack comprising: thefirst charge generation layer; the second charge generation layer; and athird organic emissive layer disposed between the first chargegeneration layer and the second charge generation layer and within athreshold distance of the first charge generation layer or the secondcharge generation layer, wherein the threshold distance is the distanceat which a total non-radiative decay rate constant of the second organicemissive material is equal to a total radiative decay rate constant ofthe second organic emissive material.
 2. The device of claim 1, furthercomprising a down-conversion layer disposed in a stack with the firstand second non-plasmonic OLEDs.
 3. The device of claim 1, furthercomprising an outcoupling layer disposed in a stack with the firstelectrode and the second electrode.
 4. The device of claim 3, whereinthe outcoupling layer comprises a structure selected from the groupconsisting of: a grating; a corrugated layer; a nanopatch antenna; ananoparticle outcoupling structure; and a through-hole array.
 5. Thedevice of claim 1, wherein at least one of the first organic emissivelayer, the second organic emissive layer, and the third organic emissivelayer comprises a plurality of emissive materials.
 6. The device ofclaim 1, wherein the third organic emissive material comprises a blueemissive material.
 7. The device of claim 1, further comprising at leastone color filter disposed in a stack with the first and secondnon-plasmonic OLEDs.
 8. The device of claim 1, further comprising aplurality of color filters, each being of a different color.
 9. Thedevice of claim 1, further comprising a substrate; wherein the first andsecond non-plasmonic OLEDs are disposed over a first side of thesubstrate.
 10. The device of claim 9, further comprising at least onecomponent selected from the group consisting of: a color filter, a downconversion layer, an up conversion layer, and a radiation patternmodifying element, wherein the at least one component is disposed on anopposite side of the substrate from the OLED stacks.
 11. The device ofclaim 9, wherein the device is configured to emit light primarilythrough the substrate.
 12. The device of claim 1, further comprising aradiation pattern modifying element disposed in a stack with the firstand second non-plasmonic OLEDs.
 13. The device of claim 12, wherein thedevice comprises a plurality of sub-pixels, and different types ofradiation pattern modifying elements are disposed over different colorsof sub-pixels.
 14. The device of claim 12, wherein the radiation patternmodifying element comprises a structure selected from the groupconsisting of: a nanopatch antenna outcoupling component; asemi-transparent metal; a dielectric material; and a distributed Braggreflector.
 15. The device of claim 12, wherein the radiation patternmodifying element causes the device to emit visible light in aLambertian or near-Lambertian pattern.
 16. The device of claim 1,wherein the first and/or second organic emissive layer comprises aphosphorescent emissive material, a fluorescent emissive material, or athermally-activated delayed fluorescent (TADF) material.
 17. The deviceof claim 1, wherein the third organic emissive layer comprises aphosphorescent emissive material, a fluorescent emissive material, or athermally-activated delayed fluorescent (TADF) material.
 18. The deviceof claim 1, wherein the third organic emissive layer comprises a redemissive material, a green emissive material, or a combination thereof.19. A consumer electronic device comprising: a display comprising: afirst non-plasmonic organic light emitting diode (OLED) stack, the firstnon-plasmonic OLED stack comprising: a first electrode; a first chargegeneration layer; and a first organic emissive layer disposed betweenthe first electrode and the first charge generation layer; a secondnon-plasmonic OLED stack disposed over the first non-plasmonic OLEDstack, the second non-plasmonic OLED stack comprising: a secondelectrode; a second charge generation layer; and a second organicemissive layer disposed between the second electrode and the secondcharge generation layer; and a plasmonic OLED stack, disposed betweenthe first and second non-plasmonic OLED stacks, the plasmonic OLED stackcomprising: the first charge generation layer; the second chargegeneration layer; and a third organic emissive layer disposed betweenthe first charge generation layer and the second charge generation layerand within a threshold distance of the first charge generation layer orthe second charge generation layer, wherein the threshold distance isthe distance at which a total non-radiative decay rate constant of thesecond organic emissive material is equal to a total radiative decayrate constant of the second organic emissive material.
 20. The consumerelectronic device of claim 19, wherein the device is at least one typeselected from the group consisting of: a flat panel display, a curveddisplay, a computer monitor, a medical monitor, a television, abillboard, a light for interior or exterior illumination and/orsignaling, a heads-up display, a fully or partially transparent display,a flexible display, a rollable display, a foldable display, astretchable display, a laser printer, a telephone, a cell phone, tablet,a phablet, a personal digital assistant (PDA), a wearable device, alaptop computer, a digital camera, a camcorder, a viewfinder, amicro-display that is less than 2 inches diagonal, a 3-D display, avirtual reality or augmented reality display, a vehicle, a video wallscomprising multiple displays tiled together, a theater or stadiumscreen, and a sign.